Experience superior sun protection with the Purito SEOUL Wonder Releaf Centella Daily Sun Lotion SPF50+ PA++++. This sunscreen offers high-level defense with SPF50+ PA++++ to safeguard sensitive skin from harmful UV rays. Infused with Centella Asiatica to calm the skin, Brown Algae Extract to protect against pollution, and a blend of hyaluronic acids to keep your skin hydrated all day.

Its fast-absorbing formula provides a light, dewy finish without any greasy residue. Designed to protect against urban stressors, this sunscreen creates a shield against pollutants like fine dust, all while maintaining a hypoallergenic, dermatologist-tested formula that’s safe for all skin types.

Recommended for: Sensitive, dry skin, and all skin types.

How to use:

1. After finishing your skincare routine, apply a generous amount to your fingertips.
2. Gently apply to areas exposed to UV rays, avoiding the eyes and mouth.
3. For optimal sun protection, apply 30 minutes before sun exposure.
4. Reapply every two hours for continuous protection throughout the day.

Ingredients:

Water, Dibutyl Adipate, Propanediol, Dipropylene Glycol, Centella Asiatica Extract, Ethylhexyl Triazone, Terephthalylidene Dicamphor Sulfonic Acid, Isododecane, Niacinamide, Sorbitan Sesquioleate, Diethylamino hydroxybenzoyl hexyl benzoate, Tromethamine, Ecklonia Cava Extract, Hyaluronic Acid, Hydrolyzed Hyaluronic Acid, Hydrolyzed Sodium Hyaluronate, Sodium Hyaluronate, Potassium Hyaluronate, Hydroxypropyltrimonium Hyaluronate, Sodium Hyaluronate Crosspolymer, Sodium Acetylated Hyaluronate, Caprylyl Methicone, Glycerin, Bis-Ethylhexyloxyphenol Methoxyphenyl Triazine, Benzotriazolyl Dodecyl p-Cresol, Polysilicone-15, Polymethylsilsesquioxane, Silica, 1,2-Hexanediol, Glyceryl Stearate, Ammonium Acryloyldimethyltaurate/VP Copolymer, Cetearyl Alcohol, Hydroxyacetophenone, Potassium Cetyl Phosphate, Palmitic Acid, Stearic Acid, Polyacrylate Crosspolymer-6, Acrylates/C10-30 Alkyl Acrylate Crosspolymer, Caprylyl Glycol, Dipotassium Glycyrrhizate, Allantoin, Panthenol, Adenosine, Ethylhexylglycerin, Myristic Acid, Butylene Glycol, t-Butyl Alcohol